Global Extreme Ultraviolet Lithography Euvl Market
市场规模（十亿美元）
CAGR :
% 
 Forecast Period |
2022 –2028 |
 Market Size (Base Year) |
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 Market Size (Forecast Year) |
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 CAGR |
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| Major Markets Players |
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>全球极紫外光刻市场，按光源（激光产生等离子体 (LPP)、真空火花、气体放电）、设备（光源、光学器件、掩模等）、最终用户（集成设备制造商 (IDM)、内存、代工厂等）、国家（美国、加拿大、墨西哥、巴西、阿根廷、南美洲其他地区、德国、意大利、英国、法国、西班牙、荷兰、比利时、瑞士、土耳其、俄罗斯、欧洲其他地区、日本、中国、印度、韩国、澳大利亚、新加坡、马来西亚、泰国、印度尼西亚、菲律宾、亚太地区其他地区、沙特阿拉伯、阿联酋、南非、埃及、以色列、中东和非洲其他地区）划分的行业趋势和预测到 2028 年
市场分析与洞察：全球极紫外光刻市场
预计在 2021 年至 2028 年的预测期内，极紫外光刻市场将以 16.26% 的速度增长。Data Bridge Market Research 关于极紫外光刻市场的报告提供了有关预测期内预计会盛行的各种因素的分析和见解，同时提供了它们对市场增长的影响。终端使用行业需求的增长正在加速极紫外光刻市场的增长。
极紫外光刻是指下一代光刻技术，利用最小波长来创建具有微小特征的电路，并倾向于获得具有更高分辨率的输出。该技术有助于将复杂的图案（通常突出集成电路）打印到半导体晶圆上。EUV 光刻 (EUVL) 被认为是领先的下一代光刻 (NGL) 技术之一。
全球消费者中智能手机普及率的提高是推动极紫外光刻市场增长的主要因素之一。极紫外光刻技术用于构建成本有限、功耗要求更低、复杂性更低的紧凑型电子芯片的采用率增加，以及消费应用行业对性能和存储内存的需求增加，加速了市场的增长。智能手机和个人电脑对极紫外光刻技术的倾向激增，以及该技术在制造更强大的微处理器中的高利用率进一步影响了市场。此外，城市化和数字化、包装行业需求的增加、先进技术的接受度提高、移动技术和终端使用领域的扩展对极紫外光刻市场产生了积极影响。此外，技术进步为 2021 年至 2028 年的市场参与者带来了盈利机会。
On the other hand, the high cost associated with the extreme ultraviolet lithography and lithography machines for cutting the most sophisticated chips is expected to obstruct the market growth. Limited acceptance and concerns regarding unknown technical flaws are projected to challenge the extreme ultraviolet lithography market in the forecast period of 2021-2028.
This extreme ultraviolet lithography market report provides details of new recent developments, trade regulations, import export analysis, production analysis, value chain optimization, market share, impact of domestic and localized market players, analyses opportunities in terms of emerging revenue pockets, changes in market regulations, strategic market growth analysis, market size, category market growths, application niches and dominance, product approvals, product launches, geographic expansions, technological innovations in the market. To gain more info extreme ultraviolet lithography market contact Data Bridge Market Research for an Analyst Brief, our team will help you take an informed market decision to achieve market growth.
Extreme Ultraviolet Lithography Market Scope and Market Size
The extreme ultraviolet lithography market is segmented on the basis of light source, equipment and end user. The growth among segments helps you analyze niche pockets of growth and strategies to approach the market and determine your core application areas and the difference in your target markets.
- On the basis of light source, the extreme ultraviolet lithography (EUVL) market has been segmented into laser produced plasmas (LPP), vacuum sparks and gas discharge.
- On the basis of equipment, the extreme ultraviolet lithography (EUVL) market has been segmented into light source, optics, mask and others.
- On the basis of end user, the extreme ultraviolet lithography (EUVL) market has been segmented into integrated device manufacturer (IDM), memory, foundry and others.
Global Extreme Ultraviolet Lithography Market Country Level Analysis
The ultraviolet lithography (EUVL) market is analyzed and market size, volume information is provided by country, light source, equipment and end user as referenced above.
The countries covered in the global ultraviolet lithography (EUVL) market report are the U.S., Canada and Mexico in North America, Brazil, Argentina and Rest of South America as part of South America, Germany, Italy, U.K., France, Spain, Netherlands, Belgium, Switzerland, Turkey, Russia, Rest of Europe in Europe, Japan, China, India, South Korea, Australia, Singapore, Malaysia, Thailand, Indonesia, Philippines, Rest of Asia-Pacific (APAC) in the Asia-Pacific (APAC), Saudi Arabia, U.A.E, South Africa, Egypt, Israel, Rest of Middle East and Africa (MEA) as a part of Middle East and Africa (MEA).
亚太地区在紫外光刻 (EUVL) 市场中占据主导地位，由于该地区对小型化设备和先进智能手机的需求很高，预计在 2021 年至 2028 年的预测期内将出现显着增长。
报告的国家部分还提供了影响单个市场因素和国内市场监管变化，这些因素和变化影响了市场的当前和未来趋势。下游和上游价值链分析、技术趋势和波特五力分析、案例研究等数据点是用于预测单个国家市场情景的一些指标。此外，在提供国家数据的预测分析时，还考虑了全球品牌的存在和可用性以及它们因来自本地和国内品牌的大量或稀缺竞争而面临的挑战、国内关税和贸易路线的影响。
竞争格局和极紫外光刻市场份额分析
紫外线光刻 (EUVL) 市场竞争格局按竞争对手提供详细信息。详细信息包括公司概况、公司财务状况、收入、市场潜力、研发投资、新市场计划、区域存在、公司优势和劣势、产品发布、产品宽度和广度、应用主导地位。以上提供的数据点仅与公司对紫外线光刻 (EUVL) 市场的关注有关。
紫外线光刻 (EUVL) 市场报告中涉及的主要参与者包括 Cannon Inc.、ASML、Nuflare Technology Inc.、SAMSUNG、Intel Corporation、Nikon Corporation、SUSS Microtec SE、台湾半导体制造有限公司、Ultratech Inc.、Vistec Electron Beam GmbH、Zeiss International、Toppan Printing Co. Ltd.、NTT Advanced Technology Corporation、Toshiba India Pvt. Ltd. 和 Global Foundries 等国内外参与者。市场份额数据分别针对全球、北美、欧洲、亚太地区 (APAC)、中东和非洲 (MEA) 和南美提供。DBMR 分析师了解竞争优势，并为每个竞争对手分别提供竞争分析。
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研究方法
Data collection and base year analysis are done using data collection modules with large sample sizes. The stage includes obtaining market information or related data through various sources and strategies. It includes examining and planning all the data acquired from the past in advance. It likewise envelops the examination of information inconsistencies seen across different information sources. The market data is analysed and estimated using market statistical and coherent models. Also, market share analysis and key trend analysis are the major success factors in the market report. To know more, please request an analyst call or drop down your inquiry.
The key research methodology used by DBMR research team is data triangulation which involves data mining, analysis of the impact of data variables on the market and primary (industry expert) validation. Data models include Vendor Positioning Grid, Market Time Line Analysis, Market Overview and Guide, Company Positioning Grid, Patent Analysis, Pricing Analysis, Company Market Share Analysis, Standards of Measurement, Global versus Regional and Vendor Share Analysis. To know more about the research methodology, drop in an inquiry to speak to our industry experts.
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