Global Sputtering Equipment Cathode Market
Sputtering is a method used to place thin films on the surface of a material. It is a method whereby a material is inundated by high-energy plasma or gas particles ending in microscopic particles being ejected from the material surface. They are mainly used for the manufacturing of the thin layers of the devices such as disk drives, optical devices, semiconductor devices and others. Sputtering indicates casting material out of a goal and placing it on a substratum such as a silicon wafer. Liner are circular are two common types of the sputtering equipment cathode. The sputtering method starts when a substratum to be coated is positioned in a vacuum chamber comprising an inert gas-generally Argon-and an adverse charge is applied to a product from the target source that is deposited on the substratum causing the plasma to shine.
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Some of the factors responsible for the growth of this market are as follow:
- Increase use of Artificial Intelligence in various industries such as electronics and aerospace: Artificial Intelligence (AI) enables machines to learn quickly, adapt to fresh inputs, and execute duties that are human-like. AI has the ability to perform regular, elevated-volume, reliable and tireless computerized duties. Today companies are adding AI abilities in their products so they can add intelligence in them. AI uses neural networks that have many nested loops to evaluate more information. With profound neural networks, AI achieves incredible precision. They have the ability to improve the present analytic technology such as time series technology and computer vision
- Advancement in technology such as magnetron sputtering technology: With the increasing technologies, sputtering is also getting advanced. Magnetron sputtering is a method of physical vapor deposition coating used to place thin films of materials on other surfaces or substrates, such as metals, plastics and ceramics. Their main function is to improve the corrosion resistance abilities of magnesium and steel alloys. This method is widely used in industrial, scientific, commercial and research industries. It is a strong, versatile and material-independent coating method that can be used with a multitude of products to coat most prevalent surfaces
The global sputtering equipment cathode market is segmented on the basis of type as linear, and circular and application as automotive, electronics, aerospace, and others.
Few of the launches and acquisition by prominent player the market are:
- In March 2018, Bühler Group announced the acquisition of Sputtering Components Inc. With this acquisition, the company will be able to extend their capabilities and this will also help them to strengthen their position in the market. Both the companies already have worked together for many years and solidify their position with systems for coating of architectural glass
- In June 2018, Edmund optics announced that they have ordered SPECTOR Ion Beam Sputtering System from Veeco Instruments Inc so that they can expand their portfolio in high quality laser optics for visible, ultravoilet and infrared system. This will strengthen their position in the market and will be able to serve better solution for the market
“According to Data Bridge Market Research, global sputtering equipment cathode market is projected to register a substantial CAGR of 5.4% in the forecast period of 2019-2026”
Few of the major competitors currently working global sputtering equipment cathode market are Kurt J. Lesker Company, Veeco Instruments Inc, Semicore Equipment, Inc, Soleras Advanced Coatings BVBA, Sputtering Components, KDF Electronic & Vacuum Services Inc, PVD Products, Inc, Angstrom Sciences, Inc, Kenosistec Srl, AJA International, Applied Materials, Inc, CANON ANELVA CORPORATION, OC Oerlikon Corporation AG, ULVAC Technologies, Inc., KOLZER SRL, KOBE STEEL, LTD, Izovac and others
These sputtering equipment cathodes are widely used in application such as electronics, aerospace, automotive and other. They are facing high demand from automobile industry due to fact as they provide environment friendly metallization with nil production of volatile organic compounds. It enables producers to replace expensive metal components with lightweight, low-cost solutions that are covered with thin required metals. One of the recent magnetron sputtering technologies involves confocal sputtering method which has the ability to have numerous objectives in the vacuum chamber resulting in time and cost savings. These are some of the factor which is creating new opportunities for this market.
